AN-080E Rev.1.0
Apr-2011
19
Fuji Power MOSFET
Fuji Electric Co., Ltd.
4. Circuit design and mechanism of breakdown
4-1. Avalanche breakdown
4-1-1. What is avalanche breakdown?
When an inductance load such as transformer is subjected to high-speed switching using a Power MOSFET,
excessive surge voltage may be applied, the withstand voltage of the Power MOSFET may be exceeded, and
the breakdown area may be entered. The avalanche breakdown is defined as a mode in which due to
avalanche operation the channel temperature Tch and avalanche current IAR exceed the absolute maximum
rating, resulting in breakdown.
(1) Mechanism of avalanche breakdown.
Figure 4-1 shows the cross-sectional structure of the MOSFET.
A bipolar transistor exists parasitically within the MOSFET.
If overvoltage is applied to the MOSFET, and the withstand
voltage of the device is exceeded, avalanche current is fed.
The major flows of the avalanche current is as follows:
[1] Drain - Rzd - Vzd – Source
[2] Drain - Rzb - Vzb - Rb - Source
First of all, the avalanche current flows by the route of [1] when
the avalanche happens. The avalanche voltage increase by
generation of heat because of the avalanche current, and the
avalanche current begins to flow to the route of [2]. The potential
difference is caused by this current in Rb and heat is generated.
The resistance of Rb increase by generation of heat, and VBE of
a parasitic bipolar transistor decrease. The current that flows in
Vzb divides into Rb and VBE when the potential difference in Rb
higher than VBE of a parasitic bipolar transistor, and a parasitic bipolar transistor malfunctions. Therefore, the
current crowding happens in the part where the avalanche was caused, and MOSFET breakdown.
(2) Technology for increasing the resistance to avalanche breakdown
Generally, to improve the resistance to avalanche breakdown of the MOSFET, the base Rb of the parasitic
bipolar transistor is decreased, and a cell structure not allowing concentration of electric field is adopted. The
SuperFAP series adopts the following techniques to increase the avalanche capacity.
[1] Adopting a structure where by arranging a simple spherical p diffusion layer carefully, concentration of
electric field is loosened to eliminate local concentration of avalanche current
[2] Adopting a structure where by arranging a simple spherical p diffusion layer carefully, the entire area of pn
diode is increased, and avalanche permissible current per unit area is increased
[3] Adopting a structure where by forming a high-concentration p+ diffusion layer inside the channel p diffusion
layer, the base resistance Rb of the parasitic bipolar transistor is decreased and the operation of the
parasitic bipolar transistor is suppressed
(3) Measurement of the avalanche capacity
Figure 4-2 illustrates a circuit for measuring the avalanche capacity of the MOSFET, and Fig.4-3 illustrates the
measured waveform. If a voltage exceeding VGS(th) is biased to the gate of the MOSFET, drain current ID starts
to flow within the MOSFET via an inductance L. At this time, the drain current ID flows within the channel area.
If the gate voltage of the MOSFET decreases to VGS(th) or lower, the drain current ID decreases, whereas the
drain voltage VDS surges. The drain voltage VDS increases until it reaches the withstand voltage of the device,
and is cramped. The residual energy accumulated in the inductance L continues flowing as drain current ID. At
this time, since the channel area is interrupted, the drain current flows as avalanche current. The capacity of
the MOSFET of consuming the energy accumulated in the inductance L is defined as the avalanche capacity.
Fig.4-1 Cross-sectional structure of
the MOSFET
Metal (Drain electrode)
Al-Si (Source electrode)
PSG (Insulation film)
Poly-Si (Gate electrode)
SiO
2
(Oxide film)
Source
Drain
Rz d
Vzd
Paras tic
Bipola Transistor
Rb
Vzb
Rz b
n
+
n
+
n
-
[2][1]